The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2005
Filed:
Dec. 01, 2003
Applicant:
May-ho Ko, Hsin-Chu, TW;
Inventor:
May-Ho Ko, Hsin-Chu, TW;
Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L021/304 ;
U.S. Cl.
CPC ...
Abstract
In accordance with the objectives of the invention a new Method and recipe is provided for etching of stacked layers of polysilicon. The invention provides for an added flash step after the conventional Overall Etch (OE).
Ko, May-Ho. (2005). Flash process for stacking poly etching (U.S. Patent No. 6943119). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6943119
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile