The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6943110 B1

PDF
Full Text
Expired
Date of Patent:
Sep. 13, 2005

Filed:

Aug. 13, 2003
Applicants:

Water Lur, Taipei, TW;

David Lee, Hsinchu, TW;

Kuang-chih Wang, Taichung, TW;

Inventors:

Water Lur, Taipei, TW;

David Lee, Hsinchu, TW;

Kuang-Chih Wang, Taichung, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L021/44 ;
U.S. Cl.
CPC ...
Abstract

A cluster tool and a number of different processes for making a cobalt-silicide material are disclosed. Combinations of alloyed layers of Co—Ti—along with layers of Co—are arranged and heat treated so as to effectuate a silicide reaction. The resulting structures have extremely low resistance, and show little line width dependence, thus making them particularly attractive for use in semiconductor processing. A cluster tool is configured with appropriate sputter targets/heat assemblies to implement many of the needed operations for the silicide reactions, thus resulting in higher savings, productivity, etc.


Find Patent Forward Citations

Lur, Water. (2005). Wafer processing apparatus and methods for depositing cobalt silicide (U.S. Patent No. 6943110). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6943110

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