The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 06, 2005

Filed:

Sep. 11, 2002
Applicants:

Modest M. Oprysko, Carmel, NY (US);

Lei Shan, Yorktown Heights, NY (US);

Jeannine M. Trewhella, Peekskill, NY (US);

Inventors:

Modest M. Oprysko, Carmel, NY (US);

Lei Shan, Yorktown Heights, NY (US);

Jeannine M. Trewhella, Peekskill, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L023/48 ;
U.S. Cl.
CPC ...
Abstract

An improved electrical interconnect is formed wherein a dielectric material having a controllable characteristic is applied to at least a portion of the interconnect. The controllable characteristic of the dielectric material is selectively adjustable so that the impedance of the electrical interconnect is substantially matched to at least one impedance at first and second ends of the interconnect. In this manner, an electrical discontinuity between the first and second ends of the electrical interconnect is reduced, thereby improving an electrical performance of the interconnect.


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