The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 30, 2005

Filed:

Mar. 29, 2002
Applicants:

Jonathan Park, San Jose, CA (US);

Eugen Chen, Palo Alto, CA (US);

Richard Saito, Sunnyvale, CA (US);

Adam Wright, Santa Clara, CA (US);

Evgueni Ratchev, Milpitas, CA (US);

Inventors:

Jonathan Park, San Jose, CA (US);

Eugen Chen, Palo Alto, CA (US);

Richard Saito, Sunnyvale, CA (US);

Adam Wright, Santa Clara, CA (US);

Evgueni Ratchev, Milpitas, CA (US);

Assignee:

Altera Corporation, San Jose, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F017/50 ;
U.S. Cl.
CPC ...
Abstract

A method for creating a mask-programmed device from a preexisting design of a source device is provided. The method includes creating a netlist from a user defined circuit configuration file, configuring logic resources on the mask-programmed device produce basic logic elements, and generating a custom interconnect based on the netlist that interconnects the configured logic resources to produce the desired logic design.


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