The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 30, 2005

Filed:

Apr. 08, 2003
Applicants:

Toshiharu Furukawa, Essex Junction, VT (US);

Mark C. Hakey, Fairfax, VT (US);

Steven J. Holmes, Milton, VT (US);

William H. MA, Fishkill, NY (US);

Inventors:

Toshiharu Furukawa, Essex Junction, VT (US);

Mark C. Hakey, Fairfax, VT (US);

Steven J. Holmes, Milton, VT (US);

William H. Ma, Fishkill, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L027/108 ;
U.S. Cl.
CPC ...
Abstract

Disclosed is a method of increasing the capacitance of a trench capacitor by increasing sidewall area, comprising: Corming a trench in a silicon substrate, the trench having a sidewall; forming islands on the sidewall of the trench; and etching pits into the sidewall using the islands as a mask. The capacitor is completed by forming a node insulator on the pits and the sidewall; and filling said trench with a trench conductor.


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