The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2005
Filed:
Dec. 03, 2002
Takakazu Yamada, Shizuoka-ken, JP;
Takeshi Masuda, Shizuoka-ken, JP;
Masahiko Kajinuma, Shizuoka-ken, JP;
Masaki Uematsu, Shizuoka-ken, JP;
Koukou Suu, Chiba-ken, JP;
Takakazu Yamada, Shizuoka-ken, JP;
Takeshi Masuda, Shizuoka-ken, JP;
Masahiko Kajinuma, Shizuoka-ken, JP;
Masaki Uematsu, Shizuoka-ken, JP;
Koukou Suu, Chiba-ken, JP;
ULVAC, Inc, Kanagawa, JP;
Abstract
A thin film manufacturing system, wherein a stage for placing a substrate thereon is disposed within a vacuum reactor and a gas head for supplying a film forming gas to a central area on a top face of the vacuum reactor is arranged so that the gas head is opposed to the stage. A cylindrical sleeve member is disposed and comes in close contact with a side wall of the stage to surround a periphery of the stage. The height of the stage can be established at the position where the volume of a second space formed below the stage and connected to a vacuum discharge means is larger than that of a first space formed above the stage, in such a manner that an exhaust gas is isotropically discharged from the first space without causing any convection current therein through the interstice between the sleeve member and an inner wall surface constituting the reactor.