The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2005
Filed:
Aug. 11, 2003
Applicant:
Theodorus Hubertus Josephus Bisschops, Eindhoven, NL;
Inventor:
Theodorus Hubertus Josephus Bisschops, Eindhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B027/52 ; G03B027/42 ;
U.S. Cl.
CPC ...
Abstract
A lithographic projection apparatus including at least one temperature control member that at least partly surrounds at least one component selected from a group comprising mask and substrate tables, the projection system and an isolated reference frame for controlling the temperature of the surrounded components. The surface finish of the member is chosen to help keep the components which it partly surrounds isothermal during operation.
Bisschops, Theodorus Hubertus Josephus. (2005). Lithographic apparatus, device manufacturing method and device manufactured thereby (U.S. Patent No. 6930753). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6930753
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile