The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2005
Filed:
Apr. 23, 2003
Jiann-tyng Tzeng, Hsin-Chu, TW;
Yuh-hwa Chang, Taipei, TW;
Jiann-Tyng Tzeng, Hsin-Chu, TW;
Yuh-Hwa Chang, Taipei, TW;
Taiwan Semiconductor Manufacturing Company, Hsin-Chu, TW;
Abstract
A method of fabricating a double substrate spatial light modulator wherein the mirror sidewall residue problem is eliminated is described. A first sacrificial layer is formed overlying a glass substrate. A metal layer is deposited overlying the first sacrificial layer. First openings are formed in the metal layer. A second sacrificial layer is formed overlying the metal layer and within the first openings. The second sacrificial layer is patterned to form hinge openings to the metal layer and the second and first sacrificial layers are patterned to form post openings to the substrate within the first openings. Support posts are formed within the post openings and hinges are formed within the hinge openings wherein each of the hinges is connected to the support posts on either side of the hinge openings. Thereafter, the metal layer is patterned to form a plurality of micromirrors wherein each of the plurality of micromirrors is attached on one end to one of the hinges through the hinge openings. The first and second sacrificial layers are removed to complete fabrication of the micromirrors.