The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 2005
Filed:
Feb. 24, 2003
Wolfgang Bergner, Stormville, NY (US);
Linda A. Chen, Wappingers Falls, NY (US);
Stephan Kudelka, Fishkill, NY (US);
Franz X. Zach, Wappingers Falls, NY (US);
Wolfgang Bergner, Stormville, NY (US);
Linda A. Chen, Wappingers Falls, NY (US);
Stephan Kudelka, Fishkill, NY (US);
Franz X. Zach, Wappingers Falls, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Infineon Technologies AG, Munich, DE;
Abstract
Damage to the rim of a semiconductor wafer caused by etching processes is reduced by forming a rim of photoresist or other material around the outer edge of the wafer that has a thickness such that images projected on the rim are sufficiently out of focus that they do not develop, so that etching takes place only in the interior.