The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2005
Filed:
Oct. 14, 2003
Marcus Emile Joannes Boonman, Veldhoven, NL;
Petrus Johannes Maria Broodbakker, Eindhoven, NL;
Gerrit Johannes Nijmeijer, Eindhoven, NL;
Mingcheng Zong, Veldhoven, NL;
Jozef Cornelus Antonius Roijers, Eindhoven, NL;
Marcus Emile Joannes Boonman, Veldhoven, NL;
Petrus Johannes Maria Broodbakker, Eindhoven, NL;
Gerrit Johannes Nijmeijer, Eindhoven, NL;
Mingcheng Zong, Veldhoven, NL;
Jozef Cornelus Antonius Roijers, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
In an off-axis leveling procedure a height map of a mask is generated at a measurement station. The height map is referenced to a physical reference surface of a mask support. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of the mask support to position the exposure area on the mask in best focus during exposure.