The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2005
Filed:
Oct. 17, 2001
Applicant:
Hidetoshi Ohnuma, Kanagawa, JP;
Inventor:
Hidetoshi Ohnuma, Kanagawa, JP;
Assignee:
Sony Corporation, Tokyo, JP;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F009/00 ;
U.S. Cl.
CPC ...
Abstract
The present invention is a method capable of fabricating photomasks with improved control of gate line width wafers. More specifically a method is provided to determine a mask correction unitbased on pattern space dependencyin the pattern obtained in the photolithographic process and etching process, and correct the mask fabrication design datautilizing the mask correction unit, and fabricate photomasks using photolithographic equipment.