The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 2005
Filed:
Dec. 21, 2000
Applicant:
Dennis Lee Doane, Dallas, TX (US);
Inventor:
Dennis Lee Doane, Dallas, TX (US);
Assignee:
Texas Instruments Incorporated, Dallas, TX (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K009/00 ;
U.S. Cl.
CPC ...
Abstract
Methods for measuring the low spatial reflectivity uniformity of a DMD spatial light modulator. These methods are unique since they compensate for the non-uniformities introduced by the tilt angle of the DMD mirrors in addition to the normal system non-uniformities introduced by the illumination source and optics. These methods flatten the image and remove all but the low spatial non-uniformities from the DMD mirrors.