The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 2005
Filed:
Mar. 20, 2003
Satoshi Tanaka, Tochigi, JP;
Kouji Kakizaki, Tochigi, JP;
Youichi Sasaki, Tochigi, JP;
Gigaphoton Inc., Tokyo, JP;
Abstract
The present invention relates to a long pulse gas laser apparatus for lithography further improved in the laser oscillation efficiency and stability increased by addition of xenon gas. A gas laser apparatus for lithography has a pair of discharge electrodesprovided in a laser chamberand emits laser beam having a laser pulse width (T) of not less than 40 ns by exciting a laser gas sealed in the laser chamberby electric discharge between the pair of discharge electrodes, the laser gas containing xenon in an amount not less than 2 ppm and not more than 100 ppm in partial pressure ratio. The laser gas has been heated at least when the laser beam is emitted.