The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2005
Filed:
Jul. 17, 2002
Shunichi Murakawa, Kokubu, JP;
Yumiko Itoh, Kokubu, JP;
Hiroshi Aida, Kokubu, JP;
Katsumi Nakamura, Gamo-gun, JP;
Tetsuzi Hayasaki, Kokubu, JP;
Shunichi Murakawa, Kokubu, JP;
Yumiko Itoh, Kokubu, JP;
Hiroshi Aida, Kokubu, JP;
Katsumi Nakamura, Gamo-gun, JP;
Tetsuzi Hayasaki, Kokubu, JP;
Kyocera Corporation, Kyoto, JP;
Abstract
A member used within a plasma processing apparatus and exposed to a plasma of a halogen gas such as BClor Clis formed from a sintered body of metals of Group IIIa of Periodic Table such as Y, La, Ce, Nd and Dy, and Al and/or Si, for example, 3YO.5AlO, 2YO.AlO, YO.AlOor disilicate or monosilicate, and in particular, in this sintered body, the content of impurity metals of Group IIa of Periodic Table contained in the sintered body is controlled to be 0.15 wt % or more in total. Specifically, for this member, an yttrium-aluminum-garnet sintered body having a porosity of 3% or less and also having a surface roughness of 1 μm or less in center line average roughness Ra is utilized.