The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2005
Filed:
Oct. 31, 2003
Binod B. DE, Providence, RI (US);
Sanjay Malik, Attleboro, MA (US);
Stephanie J. Dilocker, East Providence, RI (US);
Ognian N. Dimov, Cranston, RI (US);
Binod B. De, Providence, RI (US);
Sanjay Malik, Attleboro, MA (US);
Stephanie J. Dilocker, East Providence, RI (US);
Ognian N. Dimov, Cranston, RI (US);
Arch Specialty Chemicals, Inc., Norwalk, CT (US);
Abstract
Novel copolymers suitable for forming the top layer photoimagable coating in a deep U V. particularly a 193 nm and 248 nm, bilayer resist system providing high resolution photolithography. Chemically amplified photoresist composition and organosilicon moieties suitable for use in the binder resin for photoimagable etching resistant photoresist composition that is suitable as a material for use in ArF and KrF photolithography using the novel copolymers.