The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2005
Filed:
Sep. 16, 2003
Shahab Khandan, Pleasanton, CA (US);
Christopher T. Fulmer, San Jose, CA (US);
Lori D. Washington, Union City, CA (US);
Herman P. Diniz, Fremont, CA (US);
Lance A. Scudder, Santa Clara, CA (US);
Arkadii V. Samoilov, Sunnyvale, CA (US);
Shahab Khandan, Pleasanton, CA (US);
Christopher T. Fulmer, San Jose, CA (US);
Lori D. Washington, Union City, CA (US);
Herman P. Diniz, Fremont, CA (US);
Lance A. Scudder, Santa Clara, CA (US);
Arkadii V. Samoilov, Sunnyvale, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method implemented by one or more processors, including receiving first information relating a plurality of flow rates of a species to corresponding concentrations of the species within films generated using the flow rates; receiving a desired concentration profile of the species within a desired film; and generating a plurality of process steps that, when performed, would form the desired film with the desired concentration profile by controlling the flow rate of the species based, in part, on the first information and the desired concentration profile, wherein a first concentration of the species at a first point in the desired concentration profile differs from a second concentration of the species at a second point in the desired concentration profile. A computer-readable medium, system and apparatus are also disclosed.