The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 21, 2005

Filed:

May. 09, 2002
Applicants:

Nai-cheng LU, Hsinchu, TW;

Yu-ting Liao, Hsinchu, TW;

Fu-sung Liu, Tainan, TW;

Inventors:

Nai-Cheng Lu, Hsinchu, TW;

Yu-Ting Liao, Hsinchu, TW;

Fu-Sung Liu, Tainan, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R031/26 ;
U.S. Cl.
CPC ...
Abstract

A method for fabricating an electrical test apparatus electrical probe tip first provides a probe tip substrate having a topographic surface. A high density plasma chemical vapor deposition (HDP-CVD) deposited mandrel layer is then formed upon the topographic surface. It has a series of pointed tips formed over a series of topographic features within the topographic surface. Finally, a conductor probe tip layer is formed conformally upon the high density plasma chemical vapor deposition (HDP-CVD) deposited mandrel layer and replicating the series of pointed tips. Due to the series of pointed tips and the series of replicated pointed tips, a microelectronic fabrication when tested with the electrical test apparatus electrical probe tip is tested with enhanced accuracy.


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