The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2005
Filed:
Sep. 23, 2002
Adrian Murrell, West Sussex, GB;
Bernard Harrison, West Sussex, GB;
Peter Edwards, West Sussex, GB;
Peter Kindersley, West Sussex, GB;
Takao Sakase, Rowley, MA (US);
Marvin Farley, Ipswich, MA (US);
Shu Satoh, Byfield, MA (US);
Geoffrey Ryding, Manchester, MA (US);
Adrian Murrell, West Sussex, GB;
Bernard Harrison, West Sussex, GB;
Peter Edwards, West Sussex, GB;
Peter Kindersley, West Sussex, GB;
Takao Sakase, Rowley, MA (US);
Marvin Farley, Ipswich, MA (US);
Shu Satoh, Byfield, MA (US);
Geoffrey Ryding, Manchester, MA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.