The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2005
Filed:
Jun. 23, 2003
Andrew LU, Poughkeepsie, NY (US);
Donald M. Odiwo, Wappingers Falls, NY (US);
Roger J. Yerdon, Pleasant Valley, NY (US);
Andrew Lu, Poughkeepsie, NY (US);
Donald M. Odiwo, Wappingers Falls, NY (US);
Roger J. Yerdon, Pleasant Valley, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method of repeatedly exposing a pattern across a wafer in a sequential stepping process is disclosed. The pattern that is exposed includes at least one alignment mark. Each time the exposing process is repeated, the current exposure overlaps a portion of the wafer where the pattern was previously exposed and thereby erases a previously exposed alignment mark by re-exposing an area of the wafer where the previously exposed alignment mark was located. After the exposing process is repeated across the wafer, alignment marks remain only in the last exposed areas of the wafer.