The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2005
Filed:
Feb. 05, 2003
Applicant:
Peter J. Silverman, Palo Alto, CA (US);
Inventor:
Peter J. Silverman, Palo Alto, CA (US);
Assignee:
Intel Corporation, Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01F009/00 ;
U.S. Cl.
CPC ...
Abstract
A solution for mitigating the effects of EUV substrate surface defects is disclosed. In one embodiment, a layer of polyimide material is formed upon a mask substrate surface, resulting in a substantially defect free surface adjacent to which a reflective multilayer may be positioned for EUV lithography. To reduce the possibility of polyimide outgassing and resultant added roughness to adjacently positioned layers, the layer of polyimide may be cured in a vacuum at an elevated temperature before other layers are adjacently positioned.