The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 2005
Filed:
Nov. 20, 2003
Marcus Adrianus Van DE Kerhof, Helmond, NL;
Wilhelmus Petrus DE Boeij, Veldhoven, NL;
Marcel Maurice Hemerik, Helmond, NL;
Marcus Adrianus Van De Kerhof, Helmond, NL;
Wilhelmus Petrus De Boeij, Veldhoven, NL;
Marcel Maurice Hemerik, Helmond, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic projection apparatus includes a radiation system for providing a projection beam of primary radiation, a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern, a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, a radiation sensor which is moveable in a path traversed by the projection beam, for receiving primary radiation out of the projection beam, the sensor including a radiation-sensitive material which converts incident primary radiation into secondary radiation, a radiation detector capable of detecting said secondary radiation emerging from said material, and a filter material for preventing secondary radiation from traveling in a direction away from the radiation detector.