The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 2005
Filed:
Mar. 01, 2004
Applicants:
Jongwook Kye, Pleasanton, CA (US);
Carl P. Babcock, Campbell, CA (US);
Christopher F. Lyons, Fremont, CA (US);
Inventors:
Jongwook Kye, Pleasanton, CA (US);
Carl P. Babcock, Campbell, CA (US);
Christopher F. Lyons, Fremont, CA (US);
Assignee:
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B027/32 ; G03B027/52 ; G03B027/54 ;
U.S. Cl.
CPC ...
Abstract
A method and apparatus for preventing contamination in a lithographic apparatus including a projection system, including providing the lithographic apparatus including the projection system for imaging an irradiated portion of a mask onto a target portion of a substrate and placing a pellicle over a surface of the projection system to inhibit contamination of the surface.