The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 2005
Filed:
Nov. 21, 2000
Applicants:
Stephen Yuen, Santa Clara, CA (US);
Mohit Jain, Santa Clara, CA (US);
Thorsten B. Lill, Sunnyvale, CA (US);
Inventors:
Stephen Yuen, Santa Clara, CA (US);
Mohit Jain, Santa Clara, CA (US);
Thorsten B. Lill, Sunnyvale, CA (US);
Assignee:
Other;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L021/302 ;
U.S. Cl.
CPC ...
Abstract
A substrate processing method comprises providing a substratecomprising etch resistant materialin a process zone, such as an energized gas zone in a process chamber. The etch resistant materialmay comprise a resist materialover mask material. The process may further comprise removing the etch resistant material, such as the resist material, in the process zonebefore etching underlying layers.