The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2005
Filed:
Dec. 10, 2003
Gyeong-su Keum, Suwon, KR;
Gum-hyun Shin, Suwon, KR;
Hyung-sik Hong, Suwon, KR;
Kyue-sang Choi, Seoul, KR;
Chung-hun Park, Suwon, KR;
Gyeong-Su Keum, Suwon, KR;
Gum-Hyun Shin, Suwon, KR;
Hyung-Sik Hong, Suwon, KR;
Kyue-Sang Choi, Seoul, KR;
Chung-Hun Park, Suwon, KR;
Samsung Electronics Co., Ltd., Kyungki-do, KR;
Abstract
A polarity exchanger and ion implanter include a stripping canal for passing an ion beam therethrough, a gas supply unit for providing a stripping gas into the stripping canal to change a polarity of the ion beam, a gas circulation unit for circulating the stripping gas, a flow meter for measuring a flow rate of the stripping gas, an ammeter for measuring a driving current applied to the gas circulation unit for operating the gas circulation unit, and a monitoring unit for generating a control signal to control a process for changing the polarity of the ion beam in accordance with the measured flow rate of the stripping gas and the measured driving current. The polarity exchanger and ion implanter having the polarity exchanger may prevent generation of metallic contaminants caused by a flow rate variation of the stripping gas or deterioration of a component of the gas circulation unit.