The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2005
Filed:
Mar. 13, 2002
Katsutoshi Ishii, Tsukui-gun, JP;
Yutaka Takahashi, Esashi, JP;
Harunari Hasegawa, Tsukui-gun, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A supply system in a heat-treating apparatus for a semiconductor process has a combustor (), heating unit (), and gas distributor (). The combustor () has a combustion chamber () disposed outside a process chamber (). The combustor () generates water vapor by reaction of hydrogen gas and oxygen gas in the combustion chamber (), and supplies it to the process chamber (). The heating unit () has a heating chamber () disposed outside the process chamber (). The heating unit () selectively heats a gas not passing through the combustion chamber () to a temperature not lower than an activating temperature of the gas, and supplies it to the process chamber (). The gas distributor () selectively supplies the hydrogen gas and oxygen gas to the combustion chamber (), and selectively supplies a reactive gas and inactive gas to the heating chamber ().