The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 07, 2005

Filed:

Jul. 21, 2003
Applicants:

Jeong Seok NA, Seoul, KR;

Seung Jin Yoo, Kyungki-do, KR;

Young Ho Park, Kyungki-do, KR;

Inventors:

Jeong Seok Na, Seoul, KR;

Seung Jin Yoo, Kyungki-do, KR;

Young Ho Park, Kyungki-do, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L021/20 ;
U.S. Cl.
CPC ...
Abstract

A method for manufacturing a gallium nitride (GaN)-based single crystalline substrate includes the steps of (a) forming a GaN-based single crystalline bulk on an upper surface of a growth substrate; (b) forming grooves through the growth substrate so that the growth substrate is patterned and divided into several units by the grooves, each of the grooves having a designated width; and (c) separating the GaN-based single crystalline bulk from the growth substrate by irradiating a laser beam on a lower surface of the growth substrate.


Find Patent Forward Citations

Na, Jeong. (2005). Method for manufacturing gallium nitride (gan) based single crystalline substrate that include separating from a growth substrate (U.S. Patent No. 6902989). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6902989

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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