The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2005
Filed:
Oct. 22, 2003
Raymon F. Thompson, Kalispell, MT (US);
Jeffry A. Davis, Kalispell, MT (US);
Randy Harris, Kalispell, MT (US);
Dana R. Scranton, Kalispell, MT (US);
Ryan Pfeifle, Kalispell, MT (US);
Steven A. Peace, Whitefish, MT (US);
Brian Aegerter, Kalispell, MT (US);
Raymon F. Thompson, Kalispell, MT (US);
Jeffry A. Davis, Kalispell, MT (US);
Randy Harris, Kalispell, MT (US);
Dana R. Scranton, Kalispell, MT (US);
Ryan Pfeifle, Kalispell, MT (US);
Steven A. Peace, Whitefish, MT (US);
Brian Aegerter, Kalispell, MT (US);
Semitool, Inc., Kalispell, MT (US);
Abstract
A system for processing semiconductor wafers has process units on a deck of a frame. The process units and the deck have precision locating features, such as tapered pins, for precisely positioning the process units on the deck. Process units can be removed and replacement process units installed on the deck, without the need for recalibrating the load/unload robot. This reduces the time needed to replace process units and restart processing operations. Liquid chemical consumption during processing is reduced by drawing unused liquid out of supply lines and pumping it back to storage.