The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2005
Filed:
Aug. 27, 2003
Applicants:
Satyavolu S. Papa Rao, Garland, TX (US);
Stephan Grunow, Dallas, TX (US);
Noel M. Russell, Plano, TX (US);
Inventors:
Satyavolu S. Papa Rao, Garland, TX (US);
Stephan Grunow, Dallas, TX (US);
Noel M. Russell, Plano, TX (US);
Assignee:
Texas Instruments Incorporated, Dallas, TX (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L021/44 ;
U.S. Cl.
CPC ...
Abstract
A trench () is formed in a dielectric layer (). A first metal layer () is formed in the trench using physical vapor deposition. A second metal layer () is formed in the trench () over the first metal layer () using chemical vapor deposition. Copper () is used to fill the trench () by electroplating copper directly onto the second metal ().