The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 2005
Filed:
Dec. 09, 2002
Joachim Lange, Hagenbach, DE;
Detlef Bahr, Karlsruhe, DE;
Kurt Erlacher, Graz, AT;
Bruker Axs GmbH, Karlsruhe, DE;
Abstract
An X-ray optical system with an X-ray source (Q) and a first graded multi-layer mirror (A), wherein the extension Qof the X-ray source (Q) in an x direction perpendicular to the connecting line in the z direction between the X-ray source (Q) and the first graded multi-layer mirror (A) is larger than the region of acceptance (F) of the mirror (A) at a focus (O) of the mirror (A) in the x direction, is characterized in that a first collimator (bl) is disposed at a focus of the first graded multi-layer mirror (A) between the X-ray source (Q) and the mirror (A) whose opening in the x direction corresponds to the region of acceptance of the first graded multi-layer mirror (A) and the separation qbetween first collimator (bl) and X-ray source (Q) is:/tan α,wherein αis the angle subtended by the first graded multi-layer mirror (A) in the x direction, as viewed from the first collimator (bl). This permits reduction of the disturbing radiation on the sample for constant useful X-radiation power from the source Q.