The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 2005
Filed:
Mar. 05, 2003
Applicants:
Ryujiro Udo, Ushiku, JP;
Masatsugu Arai, Chiyoda, JP;
Motohiko Yoshigai, Hikari, JP;
Masanori Kadotani, Kudamatsu, JP;
Inventors:
Ryujiro Udo, Ushiku, JP;
Masatsugu Arai, Chiyoda, JP;
Motohiko Yoshigai, Hikari, JP;
Masanori Kadotani, Kudamatsu, JP;
Assignee:
Hitachi High-Technologies Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K009/00 ;
U.S. Cl.
CPC ...
Abstract
A plasma processing apparatus capable of processing the surface of a workpiece more precisely is provided. The plasma processing apparatus for supplying a gas between a sample and a sample table to generate plasma for processing the sample, comprises an adjusting device for changing a pressure supplied to a central side of the sample and a pressure of the gas supplied to an outer peripheral side as processing of the sample progresses.