The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 2005
Filed:
Feb. 06, 2001
Jose Omar Rodriquez, Orlando, FL (US);
Laurence Darnell Schultz, Kissimmee, FL (US);
Charles A. Storey, Orlando, FL (US);
Jose Omar Rodriquez, Orlando, FL (US);
Laurence Darnell Schultz, Kissimmee, FL (US);
Charles A. Storey, Orlando, FL (US);
Agere Systems, Inc., Allentown, PA (US);
Abstract
A method () for conditioning a polishing pad () used for polishing semiconductor wafers (). The degradation in conditioning performance of a conditioning device () is accounted for by controlling at least one of the conditioning velocity (), conditioning down force () and conditioning time (). The amount of the degradation of conditioning performance during consecutive uses of a conditioning device () may be determined by measuring the friction force () between the conditioning device () and the polishing pad (), or it may be predicted on the basis of an algorithm () developed from data obtained from a plurality of representative conditioning devices ().