The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 17, 2005

Filed:

Aug. 06, 2003
Applicants:

Boris Yokhin, Nazareth Illit, IL;

Alexander Dikopoltsev, Haifa, IL;

Isaac Mazor, Haifa, IL;

David Berman, Tivon, IL;

Inventors:

Boris Yokhin, Nazareth Illit, IL;

Alexander Dikopoltsev, Haifa, IL;

Isaac Mazor, Haifa, IL;

David Berman, Tivon, IL;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N023/223 ;
U.S. Cl.
CPC ...
Abstract

Reflectometry apparatus includes a radiation source, adapted to irradiate a sample with radiation over a range of angles relative to a surface of the sample, and a detector assembly, positioned to receive the radiation reflected from the sample over the range of angles and to generate a signal responsive thereto. A shutter is adjustably positionable to intercept the radiation, the shutter having a blocking position, in which it blocks the radiation in a lower portion of the range of angles, thereby allowing the reflected radiation to reach the array substantially only in a higher portion of the range, and a clear position, in which the radiation in the lower portion of the range reaches the array substantially without blockage.


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