The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 10, 2005

Filed:

Sep. 07, 2001
Applicants:

Fumio Horiguchi, Tokyo-To, JP;

Takashi Ohsawa, Yokohama, JP;

Inventors:

Fumio Horiguchi, Tokyo-To, JP;

Takashi Ohsawa, Yokohama, JP;

Assignee:

Kabushiki Kaisha Toshiba, Minato-ku, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L029/76 ; H01L029/94 ; H01L031/062 ; H01L031/113 ; H01L031/119 ;
U.S. Cl.
CPC ...
Abstract

A semiconductor memory device comprising: a source diffusion layer formed on a semiconductor substrate and connected to a fixed potential line; a plurality of columnar semiconductor layers arranged in a matrix form and formed on the source diffusion layer and each having one end connected to the source diffusion layer commonly, the columnar semiconductor layer taking a first data state with a first threshold voltage that excessive majority carriers are accumulated in the columnar semiconductor layer, and a second data state with a second threshold voltage that excessive majority carriers are discharged from the columnar semiconductor layer; a plurality of drain diffusion layers each formed at the other end of the columnar semiconductor layer; a plurality of gate electrodes each opposed to the columnar semiconductor layer via a gate insulating film, and connected to the word line; a plurality of word lines each connected to corresponding the gate electrodes; and a plurality of bit lines each connected to corresponding the drain diffusion layers, the bit lines being perpendicular to the word lines.


Find Patent Forward Citations

Loading…