The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2005
Filed:
Jan. 15, 2002
Norihito Kawaguchi, Tokyo, JP;
Kenichiro Nishida, Tokorozawa, JP;
Mikito Ishii, Yokohama, JP;
Takehito Yagi, Odawara, JP;
Miyuki Masaki, Tokyo, JP;
Atsushi Yoshinouchi, Chiba, JP;
Koichiro Tanaka, Atsugi, JP;
Norihito Kawaguchi, Tokyo, JP;
Kenichiro Nishida, Tokorozawa, JP;
Mikito Ishii, Yokohama, JP;
Takehito Yagi, Odawara, JP;
Miyuki Masaki, Tokyo, JP;
Atsushi Yoshinouchi, Chiba, JP;
Koichiro Tanaka, Atsugi, JP;
Ishikawajima-Harima Heavy Industries Co., Ltd., Tokyo, JP;
Abstract
An object of the present invention is to provide a laser annealing method and apparatus capable of performing uniform beam emission. By means of the present invention, uniform beam application to a sample can be achieved because a linear cross-sectional configuration can be created in an optical system with a beam having a Gaussian distribution while areas of strong light intensity are avoided by rotating the beam from a laser light source at a prescribed angle by means of rotating means even when the beam pattern of the beam from the laser light source has a non-uniform intensity distribution.