The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2005
Filed:
Dec. 07, 2001
Eric J. Knappenberger, Meridian, ID (US);
Eric J. Knappenberger, Meridian, ID (US);
Micron Technology, Inc., Boise, ID (US);
Abstract
A method for making an emitter for a display device, an emitter array produced by such method, an etch mask used during such method, and a method for making such an etch mask are disclosed. The method for making the emitter comprises providing a substrate, forming a conducting layer on the substrate, forming an emitting layer on the conducting layer, forming an etch mask having a controlled distribution of a plurality of mask sizes over the emitting layer, and forming at least one emitter by removing portions of the emitting layer using the etch mask. The method for making the etch mask comprises forming an etch mask layer over an emitting layer, forming a patterning layer having a controlled distribution of mask sizes over the etch mask layer, and forming the etch mask by removing portions of the etch mask layer using the controlled distribution of mask sizes in the patterning layer. In both methods, the controlled distribution of mask sizes preferably contains one mask size which is a median mask size with an equal number of larger and smaller mask sizes, where every larger mask size has a corresponding smaller mask size, the average of the smaller and larger mask sizes being the median mask size.