The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2005
Filed:
Nov. 22, 2000
Applicants:
Volker Lehmann, München, DE;
Stefan Ottow, Dresden, DE;
Reinhard Stengl, Stadtbergen, DE;
Hans Reisinger, Grünwald, DE;
Hermann Wendt, Grasbrunn, DE;
Inventors:
Volker Lehmann, München, DE;
Stefan Ottow, Dresden, DE;
Reinhard Stengl, Stadtbergen, DE;
Hans Reisinger, Grünwald, DE;
Hermann Wendt, Grasbrunn, DE;
Assignee:
Infineon Technologies AG, Munich, DE;
Primary Examiner:
Int. Cl.
CPC ...
B01D050/00 ; B01D053/34 ;
U.S. Cl.
CPC ...
Abstract
A reactor configuration contains a housing connected to a silicon wafer. The silicon wafer has pores extending from a first main area of the silicon wafer into an interior of the silicon wafer, preferably as far as a second main area of the silicon wafer. A catalyst layer at least partly covers the surface of the pores.