The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2005
Filed:
Apr. 14, 2004
D. Mark Durcan, Boise, ID (US);
Trung T. Doan, Boise, ID (US);
Roger Lee, Boise, ID (US);
Dennis Keller, Boise, ID (US);
Ren Earl, Meridian, ID (US);
D. Mark Durcan, Boise, ID (US);
Trung T. Doan, Boise, ID (US);
Roger Lee, Boise, ID (US);
Dennis Keller, Boise, ID (US);
Ren Earl, Meridian, ID (US);
Micron Technology, Inc., Boise, ID (US);
Abstract
A method of forming minimally spaced apart MRAM structures is disclosed. A photolithography technique is employed to define patterns an integrated circuit, the width of which is further reduced by etching to allow formation of patterns used to etch digit line regions with optimum critical dimension between any of the two digit line regions. Subsequent pinned and sense layers of MRAM structures are formed over the minimally spaced digit regions.