The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 26, 2005

Filed:

Apr. 24, 2002
Applicants:

Takashi Okada, Ibaraki, JP;

Noriyasu Sinohara, Ibaraki, JP;

Kaori Shirato, Ibaraki, JP;

Masahiko Ebisawa, Ibaraki, JP;

Michinori Nishikawa, Ibaraki, JP;

Kinji Yamada, Ibaraki, JP;

Inventors:

Takashi Okada, Ibaraki, JP;

Noriyasu Sinohara, Ibaraki, JP;

Kaori Shirato, Ibaraki, JP;

Masahiko Ebisawa, Ibaraki, JP;

Michinori Nishikawa, Ibaraki, JP;

Kinji Yamada, Ibaraki, JP;

Assignee:

JSR Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F038/00 ;
U.S. Cl.
CPC ...
Abstract

a composition for film formation which can be cured in a short time period and give a film having a low dielectric constant and excellent in heat resistance, adhesion and cracking resistance, a polymer for use in the composition and a process for producing the polymer. The composition prepared by dissolving the polymer having specific repeating units in a solvent has excellent film-forming properties. The polymer has repeating units represented by the following general formula (1):wherein Z and Y are as defined hereinabove.


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