The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2005
Filed:
Aug. 08, 2002
Srikanteswara Dakshina-murthy, Austin, TX (US);
Scott A. Bell, San Jose, CA (US);
David E. Brown, Austin, TX (US);
Philip A. Fisher, Foster City, CA (US);
Srikanteswara Dakshina-Murthy, Austin, TX (US);
Scott A. Bell, San Jose, CA (US);
David E. Brown, Austin, TX (US);
Philip A. Fisher, Foster City, CA (US);
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Abstract
A method of producing an integrated circuit eliminates the need to re-oxidize polysilicon gate conductors and lines prior to removal of a hard mask used to form the gate conductors. A layer of polysilicon is provided above a semiconductor substrate. The layer of polysilicon is then doped. A mask material comprising amorphous carbon is provided above the layer of polysilicon, and the layer of mask material is patterned to form a mask. A portion of the layer of polysilicon is removed according to the mask, and the mask is removed.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile