The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2005
Filed:
Aug. 22, 2003
Mark P. Helsel, Seattle, WA (US);
David W. Wine, Seattle, WA (US);
Clarence T. Tegreene, Redmond, WA (US);
Mark P. Helsel, Seattle, WA (US);
David W. Wine, Seattle, WA (US);
Clarence T. Tegreene, Redmond, WA (US);
Microvision, Inc., Bothell, WA (US);
Abstract
A micro-electromechanical system (MEMS) scanner may be used in a range of systems including a scanned beam display or a scanned beam image capture system. The MEMS scanner may include provision for movement or oscillation in two or more axes. A mass asymmetry is introduced to the scanner. The mass asymmetry induces an oscillation component in an axis orthogonal to a primary axis of movement. The asymmetric mass may be formed by a number of means including selective application and selective removal. In some applications, the mass may be selectively formed or removed in an array of locations. The frequency, phase, and direction of induced oscillation component may be selected.