The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2005
Filed:
Oct. 10, 2000
Yosuke Shirata, Tokyo, JP;
Yosuke Shirata, Tokyo, JP;
Nikon Corporation, Tokyo, JP;
Abstract
A lithography system of in-line type includes environment sensors disposed within a chamber in which an exposure apparatus body is housed and a chamber in which a coater/developer body is housed. During a lithography process, on the basis of measured values such as air pressure temperature and humidity measured by the environment sensors, and environment control portion controls air conditioning portions in such a manner that the environmental conditions in the chambers becomes substantially the same as each other. Whereby, even when a wafer is transferred through a connecting portion, the environmental conditions in the chambers do not badly influence each other.