The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2005
Filed:
Oct. 03, 2002
Matthew G. Goodman, Chandler, AZ (US);
Tony J Keeton, Mesa, AZ (US);
Ravinder Aggarwal, Gilbert, AZ (US);
Mark Hawkins, Gilbert, AZ (US);
Matthew G. Goodman, Chandler, AZ (US);
Tony J Keeton, Mesa, AZ (US);
Ravinder Aggarwal, Gilbert, AZ (US);
Mark Hawkins, Gilbert, AZ (US);
ASM America, Inc., Phoenix, AZ (US);
Abstract
An apparatus for processing a semiconductor substrate, including a process chamber having a plurality of walls and a substrate support to support the substrate within the process chamber. A radiative heat source is positioned outside the process chamber to heat the substrate through the walls when the substrate is positioned on the substrate support. In some embodiments, lenses are positioned between the heat source and the substrate to focus or diffuse radiation from the heat source and thereby selectively alter the radiation intensity incident on certain portions of the substrate. In other embodiments, diffusing surfaces are positioned between the heat source and the substrate to diffuse radiation from the heat source and thereby selectively reduce the radiation intensity incident on certain portions of the substrate.