The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2005
Filed:
Dec. 20, 2002
Susan A. Alie, Stoneham, MA (US);
Bruce K. Wachtmann, Concord, MA (US);
David S. Kneedler, Middleton, MA (US);
Scott Limb, Cambridge, MA (US);
Kieran Nunan, Carlisle, MA (US);
Susan A. Alie, Stoneham, MA (US);
Bruce K. Wachtmann, Concord, MA (US);
David S. Kneedler, Middleton, MA (US);
Scott Limb, Cambridge, MA (US);
Kieran Nunan, Carlisle, MA (US);
Analog Devices, Inc., Norwood, MA (US);
Abstract
A metallization stack is provided for use as a contact structure in an integrated MEMS device. The metallization stack includes a titanium-tungsten adhesion and barrier layer formed with a platinum layer formed on top. The platinum feature is formed by sputter etching the platinum in argon, followed by a wet etch in aqua regia using an oxide hardmask. Alternatively, the titanium-tungsten and platinum layers are deposited sequentially and patterned by a single plasma etch process with a photoresist mask.