The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6878216 B1

PDF
Full Text
Expired
Date of Patent:
Apr. 12, 2005

Filed:

Aug. 30, 2002
Applicant:

Sadayuki Fujishima, Tosu, JP;

Inventor:

Sadayuki Fujishima, Tosu, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B003/00 ;
U.S. Cl.
CPC ...
Abstract

The present invention controls a temperature of a processing liquid to be in within an allowable processing temperature range, whereby the processing efficiency and throughputs can be improved, deterioration of the processing liquid is prevented, and the life of the processing liquid can be extended. In the liquid processing method, a chemical liquid L stored in a tankcan have temperatures controlled by heating and cooling by a heaterand cooling meansand is circulated for stand-by. the chemical liquid L in the stand-by circulation is supplied to wafers loaded in a processing chamberto process the wafers, a cooling medium of the cooling meansis heat-exchanged with the chemical liquid L in the tankto be ready for the next stand-by circulation.


Find Patent Forward Citations

Fujishima, Sadayuki. (2005). Substrate processing method and substrate processing system (U.S. Patent No. 6878216). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6878216

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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