The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 12, 2005

Filed:

Dec. 10, 2002
Applicants:

Ernst Hendrik August Granneman, Hilversum, NL;

Vladimir Ivanovich Kuznetsov, Delft, NL;

Gert Jan Snijders, Amersfoort, NL;

Inventors:
Assignee:

ASM International N.V., Bilthoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F26B007/00 ; B65B049/07 ;
U.S. Cl.
CPC ...
Abstract

In an apparatus for a treatment of a wafer at elevated temperatures, the wafer is taken out of the reactor after heat treatment with the help of a mechanical transport apparatus which preferably grips the wafer around the circumference and on the under side. The transport apparatus includes a wafer surrounding ring. The wafer is placed in a floating wafer reactor where it is cooled in a controlled manner. Transport for further action or treatment then takes place.


Find Patent Forward Citations

Granneman, Ernst Hendrik August. (2005). Apparatus, method and system for the treatment of a wafer (U.S. Patent No. 6877250). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6877250

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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