The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 2005
Filed:
Nov. 13, 2000
Kei-yu Ko, Meridian, ID (US);
LI LI, Meridian, ID (US);
Guy T. Blalock, Boise, ID (US);
Micron Technology, Inc., Boise, ID (US);
Abstract
An etchant including CHF, where x is an integer from two to five, inclusive, where y is an integer from one to four, inclusive, and where x plus y equals six etches doped silicon dioxide with selectivity over both undoped silicon dioxide and silicon nitride. Thus, undoped silicon dioxide and silicon nitride may be employed as etch stops in dry etch processes which utilize the CHF-containing etchant. CHFmay be employed as either a primary etchant or as an additive to another etchant or etchant mixture.
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