The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 2005
Filed:
Feb. 09, 2001
Kazuhito Ikeda, Tokyo, JP;
Eisuke Nishitani, Tokyo, JP;
Harunobu Sakuma, Tokyo, JP;
Kazuhiro Nakagomi, Tokyo, JP;
Kazuhito Ikeda, Tokyo, JP;
Eisuke Nishitani, Tokyo, JP;
Harunobu Sakuma, Tokyo, JP;
Kazuhiro Nakagomi, Tokyo, JP;
Hitachi Kokusai Electric Inc, Tokyo, JP;
Abstract
A substrate processing apparatus includes a chamber, a gas introducing portion, a gas discharge port, a substrate transfer gate, and a substrate moving member which moves the substrate between a substrate processing position where the substrate is processed in the chamber and a substrate transferring in-out position in the chamber where the substrate transferred into the chamber from the substrate transfer gate is located and where the substrate is located when the substrate is transferred out from the chamber through the substrate transfer gate. The gas introducing portion, the substrate processing position, the gas discharge port and the substrate transfer gate are disposed in this order. A gas restraining member which restrains processing gas for processing the substrate from flowing toward the substrate transfer gate is provided between the gas discharge port and the substrate transfer gate.