The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 05, 2005

Filed:

May. 30, 2002
Applicants:

Kousaku Matsuno, Okayama, JP;

Masao Iga, Okayama, JP;

Takeji Ueda, Okayama, JP;

Jun Kanayasu, Okayama, JP;

Satoshi Shikami, Okayama, JP;

Inventors:

Kousaku Matsuno, Okayama, JP;

Masao Iga, Okayama, JP;

Takeji Ueda, Okayama, JP;

Jun Kanayasu, Okayama, JP;

Satoshi Shikami, Okayama, JP;

Assignee:

m•FSI Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B003/02 ;
U.S. Cl.
CPC ...
Abstract

A substrate cleaning apparatus comprises an outer shell constructed such that the outer shell is selectively openable or hermetically closable to form a sealed space, an inner shell enclosed within the outer shell and having a holding member for holding a substrate, and a dispenser unit for feeding at least one of gas and liquid into the inner shell. Within the sealed space formed by the outer shell, a highly gas-tight space is formed by the inner shell to permit cleaning of the substrate within the highly gas-tight space. Also disclosed are a dispenser, a substrate holding mechanism and a substrate cleaning chamber, which are suitable for use with the substrate cleaning apparatus, and substrate cleaning processes making use of these dispenser, substrate holding mechanism and substrate cleaning chamber, respectively.


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