The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 29, 2005

Filed:

Sep. 10, 2002
Applicants:

Xiangfeng Duan, Somerville, MA (US);

Hugh Daniels, Mountain View, CA (US);

Chunming Niu, Lexington, MA (US);

Vijendra Sahi, Boston, MA (US);

James Hamilton, Sunnyvale, CA (US);

Linda T. Romano, Sunnyvale, CA (US);

Inventors:

Xiangfeng Duan, Somerville, MA (US);

Hugh Daniels, Mountain View, CA (US);

Chunming Niu, Lexington, MA (US);

Vijendra Sahi, Boston, MA (US);

James Hamilton, Sunnyvale, CA (US);

Linda T. Romano, Sunnyvale, CA (US);

Assignee:

Nanosys, Inc., Palo Alto, CA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L021/20 ; H01L029/00 ; H01L051/30 ;
U.S. Cl.
CPC ...
Abstract

Methods of positioning and orienting nanostructures, and particularly nanowires, on surfaces for subsequent use or integration. The methods utilize mask based processes alone or in combination with flow based alignment of the nanostructures to provide oriented and positioned nanostructures on surfaces. Also provided are populations of positioned and/or oriented nanostructures, devices that include populations of positioned and/or oriented nanostructures, systems for positioning and/or orienting nanostructures, and related devices, systems and methods.


Find Patent Forward Citations

Loading…