The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2005
Filed:
May. 04, 2001
Robert Clayton Wheland, Wilmington, DE (US);
Roger Harquail French, Wilmington, DE (US);
Frank Leonard Schadt, Iii, Wilmington, DE (US);
Frederick C. Zumsteg, Jr., Wilmington, DE (US);
Robert Clayton Wheland, Wilmington, DE (US);
Roger Harquail French, Wilmington, DE (US);
Frank Leonard Schadt, III, Wilmington, DE (US);
Frederick C. Zumsteg, Jr., Wilmington, DE (US);
E. I. du Pont de Nemours and Company, Wilmington, DE (US);
Abstract
Fluoroolefin/acid group or protected acid group-containing copolymers for photoresist compositions and microlithography methods employing the photoresist compositions are described. These copolymer compositions comprise 1) at least one fluoroolefin, preferably hexafluoroisobutylene, and 2) an acid group or a protected acid group (e.g., a t-alkyl ester, preferably a t-butyl ester), which together impart high ultraviolet (UV) transparency and developability in basic media to these materials. The materials of this invention have high UV transparency, particularly at short wavelengths, e.g., 157 nm and 193 nm, which makes them useful for lithography at these short wavelengths.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile